Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography.

Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography. Research Abstract Details 

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Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography. Abstract Text:

Yucong Zhu,Katsumi Sugisaki,Masashi Okada,Katsura Otaki,Zhiqiang Liu,Jun Kawakami,Mikihiko Ishii,Jun Saito,Katsuhiko Murakami,Masanobu Hasegawa,Chidane Ouchi,Seima Kato,Takayuki Hasegawa,Akiyoshi Suzuki,Hideo Yokota,Masahito Niibe,Yucong Zhu,Katsumi Sugisaki,Masashi Okada,Katsura Otaki,Zhiqiang Liu,Jun Kawakami,Mikihiko Ishii,Jun Saito,Katsuhiko Murakami,Masanobu Hasegawa,Chidane Ouchi,Seima Kato,Takayuki Hasegawa,Akiyoshi Suzuki,Hideo Yokota,Masahito Niibe,

Two basic types of interferometer, a point diffraction interferometer (PDI) and a lateral shearing interferometer (LSI) suitable for operation in the extreme-ultraviolet (EUV) wavelength region, are described. To address the challenges of wavefront measurement with an accuracy of 0.1 nm rms, we present a calibration method for the PDI that places a mask with two large windows at the image plane of the illumination point light source and a general approach to deriving the phase-shift algorithm series that eliminates the undesired zeroth-order effect in the LSI. These approaches to improving the measurement accuracy were experimentally verified by the wavefront measurements of a Schwarzschild-type EUV projection lens.

Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography. Publishing Authors By Initials

Y Zhu,K Sugisaki,M Okada,K Otaki,Z Liu,J Kawakami,M Ishii,J Saito,K Murakami,M Hasegawa,C Ouchi,S Kato,T Hasegawa,A Suzuki,H Yokota,M Niibe,Y Zhu,K Sugisaki,M Okada,K Otaki,Z Liu,J Kawakami,M Ishii,J Saito,K Murakami,M Hasegawa,C Ouchi,S Kato,T Hasegawa,A Suzuki,H Yokota,M Niibe,

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Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography. Journal Published:

PUBLICATION TYPE: Research Support, Non-U.S. Gov

Journal: Applied optics

VOLUME: 46

Page Numbers: 6783-92

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ISSN: 0003-6935

DAY: 20

MONTH: Sep

YEAR: 2007

Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography. Information

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LANGUAGE: eng

NlmUniqueID: 247660

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Grant and Affiliation Information for Wavefront measurement interferometry at the operational wavelength of extreme-ultraviolet lithography.

AFFILIATION: EUVA Sagamihara R&D Center, 1-10-1 Asamizodai, Sagamihara, Kanagawa 228-0828, Japan. zhu.yucong@nikon.co.jp

Country: United States

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MEDLINETA: Appl Opt

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