Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement.

Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement. Research Abstract Details 

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Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement. Abstract Text:

Jarod N Wilson,Hicham Idriss,

Photocatalytic reactions of heterogeneous systems, probably the most complex catalytic reactions, are central to a wide variety of phenomena including those of evolution theory, energy conversion, and environmental cleanup. Although catalytic reactions are essentially surface driven, the effect of bulk structure is particularly important for the photo processes in solid materials because it directly affects the excitation and charge transfer mechanisms. To treat surface photocatalytic reactions, it is necessary to differentiate between surface and bulk effects. We have successfully decoupled the surface-bulk effects by using a TiO2 (001) single crystal. This was achieved by allowing for surface reconstruction and measuring the rate of reaction for the two thermodynamically stable reconstructed surfaces of the oxide single crystal in ultrahigh vacuum conditions. A considerable difference, in the quantum yield of the photoreaction of acetic acid, between the two reconstructed surfaces was found. This large difference (due to different surface electron-hole recombination rates) between both reconstructed surfaces could not be seen without decoupling the surface from bulk effects.

Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement. Publishing Authors By Initials

JN Wilson,H Idriss,

For similar inorganic chemicals: elements: metals, light: titanium research abstracts see: inorganic chemicals: elements: metals, light: titanium research

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Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement. Journal Published:

PUBLICATION TYPE: Journal Article

Journal: Journal of the American Chemical Society

VOLUME: 124

Page Numbers: 11284-5

Journal Abbreviation: J. Am. Chem. Soc.

ISSN: 0002-7863

DAY: 25

MONTH: Sep

YEAR: 2002

Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement. Information

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LANGUAGE: eng

NlmUniqueID: 7503056

Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement. Keywords Mesh Terms:

KEYWORDS: Titanium

MESH TERMS: chemistry

Chemical & Substance for Abstract: Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement. Information

Substance Name: Titanium

Registry Number: 7440-32-6

Grant and Affiliation Information for Structure sensitivity and photocatalytic reactions of semiconductors. Effect of the last layer atomic arrangement.

AFFILIATION: Department of Chemistry, The University of Auckland, 23 Symonds Street, Private Bag 92019, Auckland 1020, New Zealand.

Country: United States

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MEDLINETA: J Am Chem Soc

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