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Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates.

Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates. Research Abstract Details 

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  • Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates. Abstract Text:

    A study is made by means of Monte Carlo (MC) simulations of the kinetics of random sequential adsorption (RSA) of dimers and linear and bent trimers on some geometrically disordered substrates. The MC data are explained by a semiempirical equation whose parameters interpret the jamming fraction of the process and some geometric characteristics of the systems studied.

    Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates. Publishing Authors By Initials

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    PUBMED ID PMID:

    MEDLINE DATE:

    Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates. Journal Published:

    PUBLICATION TYPE: Research Support, Non-U.S. Gov

    Journal: Journal of colloid and interface science

    VOLUME: 252

    Page Numbers: 256-8

    Journal Abbreviation:

    ISSN: 1095-7103

    DAY: 1

    MONTH: Aug

    YEAR: 2002

    Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates. Information

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    LANGUAGE: eng

    NlmUniqueID: 43125

    Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates. Keywords Mesh Terms:

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    Grant and Affiliation Information for Random sequential adsorption kinetics of dimers and trimers on geometrically disordered substrates.

    AFFILIATION: Facultad de Ciencias Físicas y Matemáticas, Universidad de Chile, Casilla, Santiago, 2777, Chile. jcortes@dqb.uchile.cl

    Country: United States

    United States Research PublicationUnited States Research Publication

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    MEDLINETA: J Colloid Interface Sci

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