An effective procedure for the fabrication of patterned nanowire arrays with micron-sized features is presented. Photolithographic methods are utilized to form set patterns onto porous anodic alumina membranes (AAM), and these modified membranes can then be used in the electrochemical growth of nanowire arrays. This approach readily allows the formation of a variety of nanowire array patterns with line widths down to several microns.
Patterned metal nanowire arrays from photolithographically-modified templates. Publishing Authors By Initials