Higher-order suppression in diffraction-grating monochromators using thin films.

Higher-order suppression in diffraction-grating monochromators using thin films. Research Abstract Details 

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Higher-order suppression in diffraction-grating monochromators using thin films. Abstract Text:

F M Quinn,D Teehan,M MacDonald,S Downes,P Bailey,

Although a continuously tuneable source of photons is a very desirable feature of synchrotron radiation it has one main drawback: the contamination of the photon beam by higher-order diffracted light. Several elements have absorption edges which lie between 10 and 200 eV, a range prone to high second- and third-order content in XUV monochromators. They can, therefore, be used as transmission filters to reduce this higher-order content. This paper describes the use of thin filters to reduce the higher-order content in diffraction-grating monochromators. Their suppression efficiency, transmission and ageing have been characterized using photoelectron spectroscopy and compared with calculated values. The effect of oxide contamination on their performance has been assessed. Filters are now installed on eight XUV beamlines and have been in routine use for several years.

Higher-order suppression in diffraction-grating monochromators using thin films. Publishing Authors By Initials

FM Quinn,D Teehan,M MacDonald,S Downes,P Bailey,

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Higher-order suppression in diffraction-grating monochromators using thin films. Journal Published:

PUBLICATION TYPE: Journal Article

Journal: Journal of synchrotron radiation

VOLUME: 5

Page Numbers: 783-5

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ISSN: 0909-0495

DAY: 1

MONTH: 05

YEAR: 1998

Higher-order suppression in diffraction-grating monochromators using thin films. Information

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LANGUAGE: eng

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Grant and Affiliation Information for Higher-order suppression in diffraction-grating monochromators using thin films.

AFFILIATION: CLRC-Daresbury Laboratory, Warrington WA4 4AD, England.

Country: Denmark

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MEDLINETA: J Synchrotron Radiat

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