Fabrication of spatial walk-off polarizing film exhibiting a large split angle by oblique silicon deposition.

Fabrication of spatial walk-off polarizing film exhibiting a large split angle by oblique silicon deposition. Research Abstract Details 

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Fabrication of spatial walk-off polarizing film exhibiting a large split angle by oblique silicon deposition. Abstract Text:

K Shiraishi,T Aoyagi,

A spatial walk-off polarizing film with a large split angle was fabricated by use of the oblique deposition method. The film is composed of slanted needlelike microcolumns of a-Si that are separated by resultant fine voids. The polarization-splitting characteristics of the film were clearly observed. The maximum split angle at a wavelength of 1.55mum was as large as 20 degrees , more than three times greater than those of existing polarizers such as those constructed of rutile and calcite.

Fabrication of spatial walk-off polarizing film exhibiting a large split angle by oblique silicon deposition. Publishing Authors By Initials

K Shiraishi,T Aoyagi,

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Fabrication of spatial walk-off polarizing film exhibiting a large split angle by oblique silicon deposition. Journal Published:

PUBLICATION TYPE: Journal Article

Journal: Optics letters

VOLUME: 23

Page Numbers: 1232-4

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ISSN: 0146-9592

DAY: 1

MONTH: Aug

YEAR: 1998

Fabrication of spatial walk-off polarizing film exhibiting a large split angle by oblique silicon deposition. Information

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LANGUAGE: eng

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Country: United States

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MEDLINETA: Opt Lett

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