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A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5).

A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Research Abstract Details 

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  • A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Abstract Text:

    charles l dezelahCharles L Dezelah,monika k wiedmannMonika K Wiedmann,kenichiro mizohataKenichiro Mizohata,ronald j bairdRonald J Baird,lauri Lauri ,charles h winterCharles H Winter,charles l dezelahCharles L Dezelah,monika k wiedmannMonika K Wiedmann,kenichiro mizohataKenichiro Mizohata,ronald j bairdRonald J Baird,lauri Lauri ,charles h winterCharles H Winter,charles l dezelahCharles L Dezelah,monika k wiedmannMonika K Wiedmann,kenichiro mizohataKenichiro Mizohata,ronald j bairdRonald J Baird,lauri Lauri ,charles h winterCharles H Winter,

    A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Publishing Authors By Initials

    cl dezelahCL Dezelah,mk wiedmannMK Wiedmann,k mizohataK Mizohata,rj bairdRJ Baird,l L ,ch winterCH Winter,cl dezelahCL Dezelah,mk wiedmannMK Wiedmann,k mizohataK Mizohata,rj bairdRJ Baird,l L ,ch winterCH Winter,cl dezelahCL Dezelah,mk wiedmannMK Wiedmann,k mizohataK Mizohata,rj bairdRJ Baird,l L ,ch winterCH Winter,

    For similar abstracts research abstracts see: abstracts research

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    A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Journal Published:

    PUBLICATION TYPE: Journal Article

    Journal: Journal of the American Chemical Society

    VOLUME: 129

    Page Numbers: 12370-1

    Journal Abbreviation: J. Am. Chem. Soc.

    ISSN: 0002-7863

    DAY: 26

    MONTH: 09

    YEAR: 2007

    A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Information

    Number of References:

    LANGUAGE: eng

    NlmUniqueID: 7503056

    A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Keywords Mesh Terms:

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    Chemical & Substance for Abstract: A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Information

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    Grant and Affiliation Information for A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5).

    AFFILIATION: Laboratory of Inorganic and Analytical Chemistry, Department of Chemical Technology, Helsinki University of Technology, P.O. Box 6100, FI-02015 Espoo, Finland.

    Country: United States

    United States Research PublicationUnited States Research Publication

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    MEDLINETA: J Am Chem Soc

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