A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5).
A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Research Abstract Details
A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Abstract Text:
A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Publishing Authors By Initials
A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Journal Published:
PUBLICATION TYPE: Journal Article
Journal: Journal of the American Chemical Society
VOLUME: 129
Page Numbers: 12370-1
Journal Abbreviation: J. Am. Chem. Soc.
ISSN: 0002-7863
DAY: 26
MONTH: 09
YEAR: 2007
A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Information
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LANGUAGE: eng
NlmUniqueID: 7503056
A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5). Keywords Mesh Terms:
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Grant and Affiliation Information for A pyrazolate-based metalorganic tantalum precursor that exhibits high thermal stability and its use in the atomic layer deposition of ta(2)o(5).
AFFILIATION: Laboratory of Inorganic and Analytical Chemistry, Department of Chemical Technology, Helsinki University of Technology, P.O. Box 6100, FI-02015 Espoo, Finland.
Country: United States
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MEDLINETA: J Am Chem Soc
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